多入射角椭偏法同时测量衬底光学常数和膜参数  

SIMULTANEOUS DETERMINATION OF SUBSTRATEOPTICAL CONSTANTS AND FILM PARAMETERSBY MULTIPLE ANGLE OF INCIDENCEELLIPSOMETRY

作　　者：周庆初 徐乃欣[1] 石声泰[1] 

机构地区：[1]中国科学院上海冶金研究所

出　　处：《应用科学学报》1989年第3期201-206,共6页Journal of Applied Sciences

基　　金：国家自然科学基金资助项目

摘　　要：本文首先讨论了多入射角椭偏法同时测量衬底光学常数和膜参数时结果的唯一性跟各未知参数间相关性的关系,从而提出了选择合适入射角的一般原则.计算了不同入射角下硅-二氧化硅体系和不锈钢钝化膜体系的椭偏参数△、(?)对n_2、k_2、n_f、、d和人射角(?)_0的一阶导数,考查了各未知参数之间的相关性.最后给出了用随机单纯形法对这两个体系进行拟合计算的实例.The dependence of the uniqueness in simultaneous determination of substrate optical parameters and film parameters by multiple angle of incidence ellipsometry on the correlation among these unknown parameters was discussed. A general guide to the selection of angle of incidence was proposed. The first derivatives of A and ψ with respect to ns, ks, nf, kf, d and angle of incidence 0 were computed for Si-SiO2 and stainless steel-passive film systems. The correlation among the unknown parameters was examined. A random simplex method was developed to obtain results lor these two systems.

关 键 词：椭偏法 衬底 光学常数 膜参数 

分 类 号：O439[机械工程—光学工程]