磁场中真空电弧液滴喷溅分析  

A Theoretical Analysis on Droplet Spraying in Vacuum Arc Coating in the Presence of a Magnetic Field

作　　者：王浩[1] 邹积岩[1] 程礼椿 林金铭 

机构地区：[1]北京大学重离子物理研究所

出　　处：《华中理工大学学报》1995年第10期26-30,共5页Journal of Huazhong University of Science and Technology

基　　金：国家教委留学回国人员资助项目

摘　　要：分析了在外加磁场作用下，真空电弧镀膜中阴极靶面液池的受力情况，导出了液滴喷溅特性受磁场影响的关系式。结果表明，纵向磁场将使喷溅方向发生偏转，形成一发射角，液池所在位置不同发射角也不同。一维横向磁场将使液池发生偏心喷溅，加剧了液滴的发射；二维横向磁场则可减轻液池的喷溅。The forces applied on the molten pool at the cathode surface under the action of an ex-ternal magnetic field during vacuum arc coating are analyzed. The expressions for the spray-ing characteristic of the droplet with the effect of the magnetic field taken into account arederived. It is shown that the longitudinal magnetic field deflects the direction of spraying andan angle will result, whose magnitude depends on the position of the molten pool. A one-di-mensional transverse magnetic field may cause an eccentric spraying which will result in in-tensive spraying while a two-dimensional transverse magnetic field can reduce the dropletspraying from the pool.

关 键 词：磁场 真空电弧镀膜 液滴喷溅 镀层 质量 

分 类 号：TB43[一般工业技术] O484.1[理学—固体物理]