化学气相沉积钨涂层及抗烧蚀性能研究  

Study on CVD for Tungsten Coating and Capability of its Anti-ablation

作　　者：张昭林[1] 李忠盛[1] 何庆兵[1] 易同斌[1] 

机构地区：[1]中国兵器工业第59研究所,重庆400039

出　　处：《表面技术》2005年第4期43-44,共2页Surface Technology

摘　　要：利用X射线荧光能谱仪、扫描电镜及其能谱仪和显微硬度计等方法对CVD法制备的钨涂层进行了成分、显微组织分析,并测试了其显微硬度以及抗烧蚀性能。研究结果表明,采用化学气相沉积法,能在炮钢基体上制备致密均匀的高纯钨涂层,其纯度大于99.9%,并且钨涂层具有典型的柱状晶体结构,同时具有良好的抗烧蚀性能。The composition, microstructure, micro-hardness and capability of anti-ablation of tungsten coating（CVD） were investigated.The experimental results show that tungsten coating may be deposited by CVD method on the gun-steel. The purity exceeds 99.9% and tungsten coating is cylindric. At the same time, tungsten coating can obviously enhance the capability of anti-ablation of gun-steel.

关 键 词：化学气相沉积 钨涂层 抗烧蚀 

分 类 号：TG174.44[金属学及工艺—金属表面处理]