纳米多孔SiO_2薄膜的制备与红外光谱研究  

Preparation and Infrared Spectral Analysis of Nanoporous Silica Thin Film

作　　者：王娟[1] 张长瑞[1] 冯坚[1] 杨大祥[1] 

机构地区：[1]国防科技大学航天与材料工程学院新型陶瓷纤维及其复合材料国防科技重点实验室,湖南长沙410073

出　　处：《光谱学与光谱分析》2005年第7期1045-1048,共4页Spectroscopy and Spectral Analysis

基　　金：武器装备预研项目(41312040307)基金资助

摘　　要：以正硅酸乙酯为原料, 采用溶胶-凝胶法, 结合旋转涂胶、超临界干燥工艺在硅片上制备了纳米多孔SiO2薄膜. XRD表明薄膜为无定形态; SEM显示薄膜具有多孔网络结构, 其SiO2粒子直径为10～20 nm. 利用FTIR研究了薄膜的结构, 纳米多孔SiO2薄膜含有Si-O-Si与Si-OR结构, 呈疏水性; 该SiO2薄膜热处理后因含有Si-OH基团而呈吸水性; 用三甲基氯硅烷对热处理SiO2薄膜进行修饰可使其呈疏水性, 修饰后的薄膜在N2中温度不高于450 ℃可保持其疏水性与多孔结构.Crack-free homogeneous nanoporous silica films on silicon wafer have been synthesized via supercritical drying of wet gel films obtained by spin-coating the polymeric silica sol, which was prepared using sol-gel method with tetraethoxysilane（TEOS） as precursor. The film is amorphous and nanoporous, and three-dimensional network, eross-linked by the primary particles whose size sdistribute between 10-20nm showed respectively by XRD and SEM micrograph. The structure of the nanoporous SiO2 thin film was studied by FTIR spectra. The SiO2 thin film was composed of Si-O-Si and Si-OR, and was hydrophobic. The film contained Si-OH and became hydrophilic after being heat-treated at 250℃ or above in air. The heat-treated SiO2 thin film becomes hydrophobic by reacting with trimethylchlorosilane（TMCS）. The TMCS-modified SiO2 thin film remains hydrophobic and can keep its nanoporous structure at a temperature lower than 450℃ in nitrogen.

关 键 词：纳米多孔 SIO2薄膜 三甲基氯硅烷 溶胶-凝胶 红外光谱 

分 类 号：TB343[一般工业技术—材料科学与工程] O657.3[理学—分析化学]