复合电磁磁控溅射靶  

A New Planar Magnetron Cosputtering Cathodes

作　　者：范玉殿[1] 马志龙[1] 孙培芬 尤引娟[1] 

机构地区：[1]清华大学材料科学与工程系

出　　处：《真空》1989年第1期24-29,共6页Vacuum

基　　金：国家自然科学基金委员会资助(合同号NSFC 9587007-03)

摘　　要：复合电磁靶是由两个电磁铁分别产生两个圆环状跑道磁场的新型磁控靶。两个跑道磁场的水平磁场均可连续调节，对应两个跑道磁场分别安装Ａ和Ｂ两种纯金属靶材，即可镀制合金膜。调节两个跑道磁场的场强对比，即可实现膜层的成分调节。复合电磁靶可以溅射７ｍｍ厚的铁靶。复合电磁靶的应用实例是镀制二元合金系统的变成分合金膜。For the purpose investigating the structure and/or properties of alloy thin films, sometimes a series of specimen with different compositions must be prepared. There are many methodes to fulfil this requirment. We have devised two types of cosputtering cathode to fulfil this need. One type of cospu- ttering cathode is called the complex cathode. It consists of two olectro-mag nets, each producing a circular magnetic race track, so that the magnetic field strength of both race track can be regulated separately. The regulating range is 30mT to 150mT during cospottering A-B alloy films, pure A and B metal targets are coincident with two race track respectively. The Complex target has been employed to study the metallic glass formation. Seventeen binary systems have been studied..

关 键 词：溅射装置 双靶 双磁控 

分 类 号：TG174.44[金属学及工艺—金属表面处理]