不锈钢载波钝化膜的光电化学研究  

PHOTOELECTROCHEMICAL INVESTIGATION OF A.V.PASSIVE FILM ON 304 STAINLESS STEEL

作　　者：颜立成[1] 张俊喜[2] 魏增福[3] 张鉴清[4] 

机构地区：[1]杭州师范学院,杭州310036 [2]上海电力学院电化学研究室国家电力公司热力设备腐蚀与防护重点实验室,上海200090 [3]广东省电力试验研究所,广州510600 [4]浙江大学化学系

出　　处：《中国腐蚀与防护学报》2005年第4期209-212,共4页Journal of Chinese Society For Corrosion and Protection

基　　金：上海市教委重点学科基金

摘　　要：采用光电化学方法研究了304不锈钢载波钝化膜在硼酸/硼砂溶液中的光电化学性质.通过测量钝化膜的光电流与入射光光子能量的关系和光电流与测量电位的关系,结合半导体理论,对载波钝化膜的半导体特性和结构进行了分析.结果表明,载波钝化膜是一高度无序的非晶态半导体膜且具有p型半导体特性.膜层的光电流对测量电位的响应在一定范围内符合Poole-Frenkel效应,但在其它范围内则具有一定的复杂性.A Photoelectrochemical investigation has been carried out on 304 stainless steel alternating voltage （A.V.） passive films in 0.05mol/L H3BO3＋0.05mol/L Na2B4O7·10H2O solution. The dependences of photocurrent on the measuring potential （E） and the wavelength of incident light have been studied. Results show that the A. V. passive film is a highly disordered amorphous state. The photoelectrochemical behavior of passive film indicates that the passive film is p-type semiconductor. The relationship between iph and E is conformity with Poole-Frenkel effect in short potential range, while, it is complicated in the rest potential range owing to the changing of its composition with potential.

关 键 词：载波钝化 光电化学 半导体性质 不锈钢 钝化膜 

分 类 号：TG178[金属学及工艺—金属表面处理]