RB－SiC／MoSi_2复合材料的界面特征  

INTERFACE FEATURE OF RB-SiC/MOSi_2 COMPOSITE

作　　者：胡冬昉 黄汉铨[1] 黄建宇[1] 夏非[1] 

机构地区：[1]中国科学院金属研究所,清华大学材料系无机非金属材料教研室

出　　处：《金属学报》1995年第3期B135-B138,共4页Acta Metallurgica Sinica

基　　金：中国科学院金属研究所固体原子像开放研究实验室资助

摘　　要：采用（Ｓｉ＋Ｍｏ）合金浸渗反应烧结ＳｉＣ，以难熔ＭｏＳｉ_２作为第二相取代ＲＢ－ＳｉＣ中的游离Ｓｉ，从而获得ＲＢ－ＳｉＣ／ＭｏＳｉ_２复合材料．实验结果表明，ＭｏＳｉ_２均匀、连续地分布于ＳｉＣ颗粒界面处，形成连续网络．界面是由ｔ－ＭｏＳｉ_２和β－ＳｉＣ两相交错重叠所构成．界面层处未观察到反应层和非晶态物质，过渡层厚约５ｎｍ．The RB-SiC/MoSi_2 composite was prepared by infiltration of Mo-Si melt, foaming MoSi_2 as a secondary phase, instead of residual Si in order to prevent the damage over 1400 ℃. Observations under SEM, TEM and HREM on the interface feature of the RB-SiC/MoSi_2 composite had shown that the uniform and continous network distributed along SiC grain boundaries. the thickness was about 5nm. The interface was composed of t-MoSi_2 and β-SiC, two-phase overlapped each other. Neither reaction layer nor amorphous matter was observed.

关 键 词：浸渗 烧结 碳化硅 二硅化钼 复合材 

分 类 号：TB332[一般工业技术—材料科学与工程]