CVD工艺尾气处理系统  

A Residual Process Gas Handler for Chemical Vapor Deposition

作　　者：李晓峰[1] 

机构地区：[1]四川重庆电子工业部第24研究所

出　　处：《微电子学》1995年第3期35-39,共5页Microelectronics

摘　　要：本文就ＣＶＤ工艺尾气处理进行了详细的介绍，并着重对ＣＶＤ工艺尾气处理ＣＤＯ系统的反应机理、构造及使用进行了分析和讨论。A detailed description is made of the handling of residual process gas in chemical va- por deposition(CVD).A controlled combustion decomposition and oxidation(CDO)system used for residual gas handling in CVD is introduced. Its mechanism of reaction is analyzed and the con- struction of the system is discussed. Also,the use of the CDO system is examined.

关 键 词：半导体 工艺 化学气相淀积 尾气处理 

分 类 号：TN305[电子电信—物理电子学]