用于液晶显示的透明导电膜  

TCO Film for LCD

作　　者：钟伯强[1] 俞大畏[1] 潘惠英[1] 

机构地区：[1]中国科学院上海硅酸盐研究所

出　　处：《无机材料学报》1995年第1期125-128,共4页Journal of Inorganic Materials

基　　金：国家863经费资助

摘　　要：采用低衬底温度射频溅射的方法制得了低电阻率、高透过率的透明导电膜，沉积时的氧分压、衬底温度等对透明导电膜有很大的影响．衬底温度为室温时，制出了４．５×１０－４Ω·ｃｍ的透明导电膜．在彩色滤色膜或保护膜上沉积透明导电膜时，只能在低于它们的耐热温度以下，并注意排除有机膜吸附的气体．Thansmittance Conductive Oxide (TCO) films were deposited by RF sputtering using indium tin chide targets. Low resistivity of 3.5×10-4Ω·cm was obtained under optimum conditions, depending on oxygen partial pressure and substrate temperature. When TCO films are deposited on color filter or protective films, the substrate temperatures have to be controlled below the highest thermal resistance temperature of color filter or protective films, and adhesive gases have to be expeled from colour filter or protective films.

关 键 词：导电膜 液晶显示 彩色滤色膜 溅射 

分 类 号：TN104.3[电子电信—物理电子学]