加速剂对化学镀镍层组成与结构的影响  

The Effect of Accelerator on the Composition and Structure of Chemically Plated Nickel Deposit

作　　者：方景礼[1] 武勇[1] 韩克平[1] 张敏[1] 

机构地区：[1]南京大学应用化学研究所配位化学国家重点实验室

出　　处：《应用化学》1995年第6期50-52,共3页Chinese Journal of Applied Chemistry

摘　　要：加速剂对化学镀镍层组成与结构的影响方景礼，武勇，韩克平，张敏（南京大学应用化学研究所配位化学国家重点实验室南京２１００９３）关键词化学镀镍，Ｎｉ０Ｐ合金，加速剂，硫脲化学镀镍磷合金具有耐蚀性、可焊性、厚度均匀和硬度高等优点，已得到广泛应用。为提高生产...The effect of organic sulfur accelerator on the deposition rate of chemical nickel-plating and on the oxidation rate of sodium hypophosphite was studied. It is found that theacceleration mechanism is due to the catalytic action of accelerator for the oxidation of hy-pophosphite, The results of XPS Indicate that the coating is composed of Ni and Ni_2P alloy.The composition (relative atomic concentration %)of the Ni-P coating are Ni 74.3%,P18.3%,O 5.8% and S 1.6% as obtained from the AES depth profile ctirves.

关 键 词：化学镀镍 镀镍 加速剂 硫脲 

分 类 号：TQ153.12[化学工程—电化学工业]