Ti离子注入对Al阳极氧化膜层阻抗性质的影响  

EFFECT OF Ti ION IMPLANTATION ON THE IMPEDANCE PROPERTIES OF ANODIC OXIDE FILM ON ALUMINUM

作　　者：田连朋[1] 左禹[1] 赵景茂[1] 熊金平[1] 张晓丰[1] 赵旭辉[1] 

机构地区：[1]北京化工大学材料科学与工程学院,北京100029

出　　处：《金属学报》2005年第8期804-808,共5页Acta Metallurgica Sinica

基　　金：国家自然科学基金项目59971005国家重点基础研究发展规划项目G19990650资助

摘　　要：对L3纯Al进行了Ti离子注入与阳极氧化,用X射线光电子能谱仪(XPS)分析了阳极氧化膜层的表面成分,利用电化学阻抗谱(EIS)研究了阳极氧化膜的腐蚀行为.结果表明,Ti离子以TiO2的形式存在于Al阳极氧化膜层中, Ti离子的注入并不影响Al阳极氧化膜的非晶结构. Ti离子注入可以使Al阳极氧化膜在酸性和碱性的NaCl溶液中的阻抗参数R 明显提高,参数C降低.Commercial pure aluminum L3 was implanted by Ti ions and then anodic oxidation was carried out. Electrochemical impedance spectroscopy （EIS） and XPS were used to study the influences of Ti ion implantation on corrosion behavior of anodic oxide film in NaC1 solution. XPS analysis revealed that Ti is present in the anodic film as TiO2. XRD proved that Ti ions implantation does not change the amorphous structure of the film. EIS showed that the implantation can improve the corrosion resistance of the anodic oxide films in acidic and basic solutions, and the parameters R and C in EIS increased and decreased, respectively.

关 键 词：AL 阳极氧化 离子注入 电化学阻抗谱 

分 类 号：TG172[金属学及工艺—金属表面处理]