检索规则说明:AND代表“并且”;OR代表“或者”;NOT代表“不包含”;(注意必须大写,运算符两边需空一格)
检 索 范 例 :范例一: (K=图书馆学 OR K=情报学) AND A=范并思 范例二:J=计算机应用与软件 AND (U=C++ OR U=Basic) NOT M=Visual
作 者:宗文俊[1] 孙涛[1] 李旦[1] 程凯[1] 董申[1]
机构地区:[1]哈尔滨工业大学机电工程学院,黑龙江哈尔滨150001
出 处:《哈尔滨工业大学学报》2005年第8期1036-1038,1045,共4页Journal of Harbin Institute of Technology
基 金:国家自然科学基金资助项目(50175022)
摘 要:为研究单晶金刚石晶体机械研磨过程中表层材料的去除机理,首先从理论上分析了单晶金刚石晶体在机械研磨过程中表层材料发生塑性变形的临界条件,并利用原子力显微镜对研磨后的(110)晶面和(100)晶面进行观测,发现两个晶面沿易磨方向<100>和难磨方向<110>研磨时的研磨表面都存在塑性变形后的纳米沟槽,表明表层材料实现了塑性方式去除.但在相同的晶面和扫描范围内,沿易磨方向研磨的表面塑性沟槽数目少,表面波纹明显;而难磨方向的研磨表面塑性沟槽数目多,所获得的表面粗糙度低.对(110)晶面和(100)晶面各个研磨方向的最大塑性沟槽深度比较的结果表明,两个晶面的最大塑性沟槽深度具有显著的各向异性.The critical condition for plastic deformation of lapped surface layer in mechanical lapping single crystal diamond is analyzed in theory firstly. And also, the lapped surfaces are observed by atomic force microscope (AFM). The AFM topographies reveal that all the surfaces lapped in the 〈 100 〉 and 〈 110 〉 directions on the named (110) and (100) planes consist of plastic grooves in nanometric scale, which indicates the lapped surface layer can be removed in plastic mode. However, within the same AFM scanning area and on the same crystal plane, the groove number lapped in the 〈 100 〉 direction is smaller than that lapped in the 〈 110 〉 direction, but the former groove width and surface waviness are larger than that of the later. So the surface roughness lapped in the 〈 110 〉 direction is smaller. At last, the maximal groove depths lapped in different lapping directions on the (110) plane and (100) plane are compared with each other. The results show that either the (110) plane or the (100) plane has strong anisotropy in the maximal groove depth.
分 类 号:TG580[金属学及工艺—金属切削加工及机床] TQ164[化学工程—高温制品工业]
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在载入数据...
正在链接到云南高校图书馆文献保障联盟下载...
云南高校图书馆联盟文献共享服务平台 版权所有©
您的IP:216.73.216.249