射频反应溅射(Al,Ti)N涂层的微结构与力学性能  

Microstructure and Mechanical Properties of Reactively Sputtered(Al,Ti)N Coatings

作　　者：赵文济[1] 梅芳华[1] 董云杉[1] 李戈扬[1] 

机构地区：[1]上海交通大学金属基复合材料国家重点实验室,上海200030

出　　处：《材料工程》2005年第9期48-52,共5页Journal of Materials Engineering

基　　金：上海市科学技术开发基金资助项目(037252052)

摘　　要：采用Al-Ti镶嵌复合靶在不同氮分压下制备了一系列(Al,Ti)N涂层,并采用EDS,AFM,XRD,TEM和微力学探针表征了涂层的沉积速率、化学成分、微结构和力学性能,研究了氮分压对涂层的影响。结果表明,氮分压对(Al,Ti)N涂层影响显著:合适的氮分压可以得到化学计量比的(Al,Ti)N涂层,涂层为单相组织,并呈现(111)择优取向,最高硬度和弹性模量分别达到36.9GPa和476GPa。过低的氮分压不但会造成涂层贫氮,而且涂层中的Al含量偏低,硬度不高。氮分压过高,由于存在“靶中毒”现象,尽管涂层的成分无明显变化,但会大大降低其沉积速率,并使涂层形成纳米晶或非晶态结构,涂层的硬度也较低。The effect of N2 partial pressure on the microstructure and mechanical properties of reactively sputtered （Al,Ti）N coatings was studied. A series of （Al,Ti）N coatings were deposited by using Al-Ti composite target in the gas mixed with Ar and N2. The deposition rate, composition and microstructure of the coatings were characterized by EDS, AFM, XRD, TEM and a nanoindentor was used to measure their mechanical properties. The results show that N2 partial pressure has an important effect on the microstructure and properties of （Al,Ti）N coatings. （Al,Ti）N coating with stoichiomettic ratio can be easily obtained at suitable N2 partial pressure and the coating have single phase structure, presenting strong （111） texture. It reaches the highest hardness and elastic modulus of 36.9GPa and 476GPa. （Al,Ti）N coatings prepared at lower N2 partial pressure show poor N and Al content and thus have low hardness. At overhigh N2 partial pressure, the deposition rates of the coatings decrease greatly because N2 reacts with the Al-Ti mosaic target and forms nitride layers on the target surface. Under this condition, the composition of the coatings has almost no change, and the coatings show a microstructure of nanocrystalline or amorphous and low hardness.

关 键 词：(Al Ti)N涂层 反应溅射 微结构 力学性能 

分 类 号：O484.4[理学—固体物理]