硅基LiNbO_3薄膜的光波导性能研究  

Optical Waveguide Properties of LiNbO_3 Thin Films on Silicon Substrates

作　　者：王新昌[1] 叶志镇[1] 李士玲[2] 曹亮亮[1] 赵炳辉[1] 

机构地区：[1]浙江大学硅材料国家重点实验室,杭州310027 [2]山东大学物理与微电子学院,济南250100

出　　处：《真空科学与技术学报》2005年第4期245-248,共4页Chinese Journal of Vacuum Science and Technology

基　　金：国家自然科学基金重大研究规划项目资助(No.90101009)

摘　　要：利用脉冲激光沉积技术在硅衬底上生长高c轴取向LiNbO3薄膜。研究了衬底温度对薄膜质量的影响,发现衬底温度在600℃时获得了具有优异结晶质量的高c轴取向LiNbO3薄膜。采用扫描电镜和透射电镜分别对薄膜的表面、截面进行了分析,结果表明,薄膜表面光滑,晶粒均匀致密,薄膜呈与衬底垂直的柱状结构。棱镜耦合技术制备的LiNbO3薄膜具有优异的光波导性能,光损耗为1.14 dB/cm。Highly c-axis oriented LiNbO3 thin films have been grown on Si substrates with the amorphous SiO2 cladding layer by pulsed laser deposition. The effects of substrates temperature on the growth of the film texture and crystallinity have been systematically investigated. Highly c-axis oriented LiNbO3 films can be grown at a substrate temperature of 600 ℃. The SEM and TEM measurements show that the compact films have fairly smooth surfaces and uniformly grains size. The film has colunmar structure, vertical to the substrate. Good optical waveguide properties of LiNbO3 films are observed by using of the prism coupled method. The optical propagation loss of LiNbO3 films under 600 ℃ is 1.14 dB/cm.

关 键 词：脉冲激光沉积 LiNbO3薄膜 光波导 硅衬底 

分 类 号：O484.4[理学—固体物理]