试片取向与IBS沉积TbDy-Fe膜应力及磁伸性能  

Infulence of Substrate Orientation on Stress and Magnetostriction of TbDy-Fe Giant Magnetostrictive Film

作　　者：周白杨[1] 邓光华[1] 林庆彬[1] 

机构地区：[1]福州大学材料科学与工程学院

出　　处：《真空科学与技术学报》2005年第4期268-270,274,共4页Chinese Journal of Vacuum Science and Technology

基　　金：福建省科技厅高新技术与火炬计划(99-H-44);福州大学科技发展基金(XKJ(QD)-01/3);福建省高校测试基金

摘　　要：本文研究了轧制青铜试片的取向对离子束溅射(IBS)制备的TbDy-Fe超磁致伸缩膜(GMF)应力及磁致伸缩性能的影响。结果表明,溅射沉积在沿垂直轧制方向截取的试片上沉积膜的应力小于沿平行轧向截取的试片上沉积膜的应力,从而对薄膜的磁致伸缩性能产生相应的影响。TbDy-Fe giant magnetostrictive films（GMF） were grown on bronze substrates in two orientations（one is cut parallel with and the other perpendicular to the rolling direction） by ion beam sputtering（IBS）. Influence of the substrate orientation on stress and magnetization was studied. The results show that the stress of the film grown on the perpendicular substrate is smaller than that of film grown on the parallel substrate, and this can produce corresponding influance on the magnetostriction of TbDy-Fe film.

关 键 词：金属材料 TbDy—Fe薄膜 离子束溅射 应力 磁伸性能 

分 类 号：O484.5[理学—固体物理] TB43[理学—物理]