硅基SiO_2平面光波导中硼磷硅玻璃覆盖层的制备和研究  

PECVD DEPOSITION OF BOROPHOSPHOSILICATE GLASS USED FOR SILICA-BASED PLANAR LIGHTWAVE CIRCUITS

作　　者：陈思乡[1] 江征风[1] 胡业发[1] 刘文[2] 

机构地区：[1]武汉理工大学机电工程学院,湖北武汉430070 [2]武汉邮电科学研究院,湖北武汉430074

出　　处：《红外与毫米波学报》2005年第5期390-393,共4页Journal of Infrared and Millimeter Waves

基　　金：国家863计划光电子材料与器件主题项目(2001AA312020)

摘　　要：利用等离子体增强化学气相沉积方法,在S iH4/N2O反应气体中掺入PH3和B2H6制备了用于硅基S iO2平面光波导的硼磷硅玻璃覆盖层.分析了磷掺杂和硼掺杂对折射率的影响,提出了选择掺杂气体流量匹配折射率的方法.研究了退火温度和气氛对膜层性能的影响,高温退火使膜层的折射率趋于稳定,对光的吸收损耗减小;采用氧气退火可以抑制和消除氮气退火时膜层中出现的不透明的微晶粒,改善膜层质量.采用多步沉积退火方法,消除了台阶覆盖中出现的空洞和气泡,得到了台阶的覆盖性和覆盖平坦度都较好的硼磷硅玻璃膜层.The borophosphosilicate glass （BPSG） layers as the filling coatings to silica-based planar lightwave circuits were obtained by using plasma enhanced chemical vapor deposition with SiH4/N2O and PH3 , B2H6. The influence of dopants on refractive index of BPSG layers was discussed and the methods related the refractive index of BPSG layers to PH3 and B2H6 gases flows were suggested. The annealing effects of BPSG layers were studied on its optical features and surface map at different annealing conditions. By using multiple deposition followed by annealing, the perfect BPSG layers, which are without void and gap and with fine smoothness, were fabricated.

关 键 词：平面光波导 硼磷硅玻璃 等离子钵增强化学气相沉积 台阶覆盖 

分 类 号：TN713[电子电信—电路与系统]