利用Mirau显微干涉仪测量微器件的纳米级运动  

Measuring Nanoscale Motions of Microdevices Using a Mirau Interferometer

作　　者：郭彤[1] 胡春光[1] 胡晓东[1] 栗大超[1] 金翠云[1] 傅星[1] 胡小唐[1] 

机构地区：[1]天津大学精密测试技术及仪器国家重点实验室,天津300072

出　　处：《光子学报》2005年第10期1542-1545,共4页Acta Photonica Sinica

基　　金：国家863计划资助项目(2004AA404042)

摘　　要：描述了一种用于微机电系统(MEMS)纳米级微运动测量的Mirau显微干涉系统.该系统利用商业化的Mirau显微干涉仪,它直接安装在光学显微镜上,用于测量一个表面微加工水平谐振器的三维运动.面内运动取决于亮场在最佳焦平面处的图像,而离面运动则取决于频闪得到的干涉图像,该图像在物镜纳米定位器的8个不同位置处得到.实验结果表明了系统进行面内和离面运动测量的纳米级分辨力.A Mirau microscopic interferometric system for measuring three-dimensional motions of microelectromechanical systems （MEMS） with nanometer resolution is demonstrated. The system utilizes a commercial Mirau microscopic interferometer, which mounts directly on a light microscope. The system was used for full three dimensional motion measurement of a surface micromachined lateral resonator. In-plane motions were determined from StOl^action bright field images taken at the best plane of focus. Out-of-plane motions were determined from stroboscopic interferograms obtained at eight different positions of the objective nanopositioner. Experimental results demonstrate nanometer resolution for both in-plane and outof plane motions.

关 键 词：微机电系统 Mirau显微干涉仪 面内运动 离面运动 频闪照明 

分 类 号：TH741.4[机械工程—光学工程]