胱氨酸加速化学沉积镍的机理  

ACCELERATION MECHANISM OF CYSTINE FOR ELECTROLESS NICKEL DEPOSITION

作　　者：韩克平[1] 方景礼[1] 武勇[1] 张敏 王健红 

机构地区：[1]南京大学应用化学研究所

出　　处：《中国腐蚀与防护学报》1996年第2期81-86,共6页Journal of Chinese Society For Corrosion and Protection

摘　　要：研究了胱氨酸对化学沉积镍的速度、析氢量和反应活化能的影响及对Ｈ２ＰＯ氧化和Ｎｉ（２＋）还原速度的影响，分析了化学镀镍层的元素组成和价态。结果表明，胱氨酸是通过它在金属表面的吸附，并与吸附在金同表面的Ｈ２ＰＯ２－中的Ｐ相互作用，加速了Ｈ２ＰＯ２－中Ｐ－Ｈ键的断裂，稳定了反应中间体－ＨＰＯ自由基，使原子氢浓度升高，从而加快了Ｎｉ－Ｐ镀层的沉积速度与析氢的速度。he influences of cystine on the electroless nickel deposition rate, hydrogen evolution, reactive activation energy, anodic oxidation of H2PO and cathodic reduction of Ni2+ were studied. The elemental composition of the deposit and the valence state of sulfur were also determined. The acceleration mechanism of cystine could be attributed to the adsorption and interaction of cystine and H2P on the active metal surface. In result, the cleavage of P-H bond of H2PO was accelerated and the electrons were much easily transported to metal surfaCe though atom S in cystine and atom H. Thus the reductions of Ni2+,H+ and H2PO on the metal surface were accelerated simultaneously.

关 键 词：胱氨酸 化学镀镍 加速 镀镍 

分 类 号：TQ153.12[化学工程—电化学工业]