TiNi合金薄膜的脉冲激光沉积制备与应用  

PLD Preparation and Application of TiNi SMA Thin Film

作　　者：祁恒[1] 陈涛[1] 左铁钏[1] 

机构地区：[1]北京工业大学激光工程研究院,北京100022

出　　处：《微细加工技术》2005年第3期1-8,共8页Microfabrication Technology

基　　金：国家自然科学基金重点资助项目(50335050)

摘　　要：概述了三种TiNi合金薄膜的制备方法,其中重点阐述了脉冲激光沉积法,并详细介绍了TiNi合金薄膜作为微驱动元件在微流体控制系统和微操作系统中的应用。随着薄膜制备工艺和性能研究的发展,TiNi合金薄膜将在复合智能材料与结构、MEMS驱动和传感元件的设计与制造等方面具有更广阔的应用前景。Three preparation processes of TiNi SMA thin film were summarized and the pulsed laser deposition was emphasized. The apphcations of TiNi SMA Thin Films as micro-actuation devices in micro-fluid control system and micro-operation system were introduced. With the development of thin film preparation process and research on its performance, SMA thin films would be more widely applied in composite smart material/structure and design/manufacture of MEMS actuation and sensor devices.

关 键 词：形状记忆合金 薄膜 脉冲激光沉积 微机电系统 

分 类 号：TB381[一般工业技术—材料科学与工程] TB43