Improved Non-uniformity Correction Method for Uncooled Microbolometer  

作　　者：MENG Li-ya YUAN Xiang-hui LU Guo-lin HUANG You-shu 

机构地区：[1]Key Lab. of Optoelectron. Technol. and Syst. for the Education Ministry of China, Chongqing University, Chongqing 400044, CHN

出　　处：《Semiconductor Photonics and Technology》2005年第4期266-269,286,共5页半导体光子学与技术（英文版）

基　　金：NationalNaturalScienceFoundationofChina(60377036)

摘　　要：The uncooled microbolometer has a severe temperature requirement for non-uniformity correction. An improved two-point non-uniformity correction method is proposed, which can operate in wider uniform substrate temperatures. This method can control the bias voltage of MOS transistors by memory and DAC to meet two restrictions about responsivity and offset before traditional two-point calibration is implemented. The simulation results seem that this non-uniformity correction can work at uniform substrate temperature with fluctuant range of 4K.The uncooled microbolometer has a severe temperature requirement for non-uniformity correction. An improved two-point non-uniformity correction method is proposed, which can operate in wider uniform substrate temperatures. This method can control the bias voltage of MOS transistors by memory and DAC to meet two restrictions about responsivity and offset before traditional two-point calibration is implemented. The simulation results seem that this non-uniformity correction can work at uniform substrate temperature with fluctuant range of 4 K.

关 键 词：MICROBOLOMETER Non-uniformity correction Substrate temperature 

分 类 号：TH81[机械工程—仪器科学与技术]