CVD金刚石膜用作TaN_2热敏打印头表面保护层的研究  

Study of CVD Diamond Serving as Protective Layers of TaN_2 Thermal-Printing Heads

作　　者：姚江宏[1] 彭军[1] 王志勇[1] 陈光华[2] 

机构地区：[1]兰州大学物理系,730000 [2]北京工业大学应用物理系,100022

出　　处：《光电子技术》1996年第2期131-136,共6页Optoelectronic Technology

摘　　要：报道了用微波等离子体化学气相淀积（MWCVD）技术在TaN2电阻材料上淀积高质量金刚石薄膜的制备工艺，以及扫描电镜、X射线衍射、拉曼光谱、压痕测试的测试结果。探讨了提高金刚石膜在非金刚石衬底成核密度与粘附性的实验方法，从实验上证实了CVD金刚石膜可以用作TaN2热敏打印头表面保护层。The results of SEM,XRD,Raman and indentation testing,as well as preparation conditions under which diamond films were deposited on TaN2 electric-resistance materials by employing microwave plasma chemical vapor deposition (MWCVD) techniques,are reported. The ways of improving diamond nucleation and adhesion on non-diamond samples are discussed. The CVD diamond serving as protective layers of TaN2 thermal-printing heads was indicated in experiment.

关 键 词：金刚石薄膜 化学气相淀积 热敏打印头 

分 类 号：TN304.18[电子电信—物理电子学]