一种获得半导体薄膜光学参数的方法  

The research of a method to obtain the optical parameters of semiconductor films

作　　者：刘涌[1] 宋晨路[1] 汪建勋[1] 韩高荣[1] 

机构地区：[1]浙江大学材料科学与工程系硅材料国家重点实验室,浙江杭州310027

出　　处：《光学技术》2005年第6期907-909,共3页Optical Technique

基　　金：国家高技术研究发展计划(863计划)资助项目(2001AA320202)

摘　　要：实现薄膜光学参数的简便测量对于薄膜的制备和应用具有重要意义。引入适用于半导体材料的Forouhi_Bloomer模型,用其表征薄膜折射率与色散的关系。考虑到粗糙度的影响,假设薄膜厚度服从正态分布,给出了模拟退火法与迭代法相结合、由可见光光谱测定薄膜光学参数的方法。作为尝试,以硅系薄膜为例进行了计算。结果表明,获得的厚度与用椭偏仪测量的结果较为吻合。该方法适用于研究和测量半导体薄膜的光学性能和膜厚,具有很高的实用价值。It is very important for preparation and application of films to easily measure their optical parameters. A method to obtain the films＇ optical parameters from its reflection and transmission spectra was presented by using the Forouhi-Bloomer dispersion relation to describe the optical parameters of semiconductor films. The roughness of films was considered, and films thickness distribution was assumed to be normal distribution. Simulated annealing method and iteration method were combined to calculate the optical parameters. For instance, three silicate films sample are calculated and results of films＇ thickness are agreement with the spectroscopic ellipsometry results. This method is valuable for semiconductor films optical research work in practices.

关 键 词：半导体薄膜 色散关系 模拟退火法 光学参数 

分 类 号：O484.41[理学—固体物理]