EM-5009B激光图形发生器光栏的修正方法  

Correction to Diaphragm of EM-5009B Laser Pattern Generator

作　　者：邓建国[1] 刘玉奎[1] 印子华[1] 邹昭伟[1] 

机构地区：[1]中国电子科技集团公司第二十四研究所,重庆400060

出　　处：《微电子学》2005年第6期591-593,596,共4页Microelectronics

摘　　要：激光图形发生器是半导体掩膜制版的主要设备之一,它具有精度高、结构复杂、操作简单和生产效率高等特点,但是,其光栏精度对加工的版图精度有很大的影响。文章根据光栏的结构原理和实际应用,详细阐述了EM-5009B激光图形发生器光栏的修正方法。Laser pattern generator is one of the major semiconductor equipments for reticle making process, which features high precision, intricate architecture, simple operation and high efficiency. The precision of diaphragm has great effect on master pattern. Based on the operational principle of the diaphragm and its application, techniques for diaphragm correction of EM-5009B laser pattern generator are described in the paper.

关 键 词：半导体设备 激光图形发生器 光栏 

分 类 号：TN305.6[电子电信—物理电子学]