ECR离子源束流发射度的实验研究(英文)  

Experimental Study on Ion Beam Emittance of ECR Ion Source

作　　者：孙良亭[1] 曹云[1] 冯玉成[1] 李锦钰[1] 赵红卫[1] 张子民[1] 王辉[1] 马宝华[1] 何伟[1] 赵环昱[1] 郭晓虹[1] 

机构地区：[1]中国科学院近代物理研究所,兰州730000

出　　处：《高能物理与核物理》2005年第12期1179-1184,共6页High Energy Physics and Nuclear Physics

基　　金：国家杰出青年基金(10225523)国家自然科学基金(10305016,10405026)资助~~

摘　　要：利用最新自行研制的电扫描发射度探测系统,在ECR离子源上进行了一系列关于ECR离子源引出束流发射度的研究.这套电扫描发射度探测系统安装在中国科学院近代物理研究所(兰州)的LECR3试验平台的束运线上.试验中,通过测量相关参数,研究了磁场、微波、掺气效应及负偏压效应等对引出束流发射度的影响.利用实验所得的结果与关于ECR等离子体和离子源束流发射度的半经验理论,分析推导了离子源各可调参数与ECR等离子体的直接关系,这为分析探索ECR离子源的工作机制提供了一定的参考依据.With a recently developed electronic-sweep scanner system, we have done series of emittance study on ECR ion source. The electric-sweep scanner system was installed on the beam line of Lanzhou Electron Cyclotron Resonance Ion Source No. 3 experimental platform of Institute of Modern Physics. The influences of magnetic field, microwave, gas mixing and biased disc on the extracted ion beam emittance have been studied in detail. With the experimental results obtained and the empirical results of ion beam emittance and ECR plasma, some conclusions on the relationship between the source tunable parameters and electron cyclotron resonance plasma are made out, which might help understand the working regime of an ECR ion source. The typical results of the experiments and the derived conclusions are presented in this paper.

关 键 词：ECR离子源 发射度 ECR等离子体 

分 类 号：O572.2[理学—粒子物理与原子核物理]