HFCVD在硬质合金基体上沉积(110)&(100)金刚石薄膜  

Deposit (110)&(100) Texture Diamond Films on Cemented Carbide Substrate by HFCVD

作　　者：刘王平[1] 余志明[1] 

机构地区：[1]中南大学材料科学与工程学院,长沙410083

出　　处：《硬质合金》2005年第4期208-211,共4页Cemented Carbides

摘　　要：以CH4和H2为反应气体,用热丝化学气相沉积(HFCVD)法在YG6(WC-6%Co)硬质合金基体上沉积了具有(110)和(100)织构的金刚石薄膜。用扫描电子显微镜、X射线衍射仪、压痕仪对样品进行了分析。结果表明:金刚石薄膜由约1μm大小立方金刚石晶粒组成,其形核密度大于2×108/cm2;(110)和(100)织构系数分别为0.59和0.033,压痕荷载为588N时附着性能良好。（110）＆ （100） Texture diamond films were deposited on cemented carbide （WC-6%Co）substrate by Hot filament chemical vapor deposition （HFCVD）, using the gas mixture of methane and hydrogen. The Surface morphology, texture and adhesion of the diamond films were characterized by scanning electron microscope （SEM）, X-ray diffraction （XRD） and Rockwell hardness tester respectively. The result shows that the diamond films are composed of cube crystals about 1μm and the density of nucleation is about 2×10^8/cm^2. The texture coefficient of （110）＆ （100）are 0.59 and 0.033 respectively, It shows good adhesion between diamond film and the substrate as the of indentation crack load is 588N.

关 键 词：HFCVD 金刚石薄膜 形貌 织构 附着力 

分 类 号：TG174.4[金属学及工艺—金属表面处理]