Development of Multilayer Optics for the EUV, Soft X-ray and X-ray Regions in Tongji University  

作　　者：WANG Zhan-shan ZHU Jing-tao WANG Hong-chang WANG Feng-li CHEN Ling-yan 

机构地区：[1]Institute of Precision Optical Engineering, Department of Physics, Tongji University, Shanghai 200092, China

出　　处：《光机电信息》2005年第12期12-21,共10页OME Information

基　　金：the National Natural Science Foundation of China under the contract numbers 60178021,60378021 , 10435050; National High Technology Research and Development“863”Program of China.(No.3)

摘　　要：In EUV and X- ray regions, multilayer mirrors are the essential and necessary optics elements. The good prospects of the EUV and X- rays for next generation lithography system, microscopy in the “water windows”, astro- nomical telescope, spectroscopy, plasma diagnostics, and X- ray laser have impelled the development of multilayer optics. The paper introduces the recent results of the multilayer optics elements in Tongji University, including beam splitters, broadband/angular polarizers, supermirrors and high- reflectance mirrors. The product of reflectivity and transmissivity is above 4% for the Mo/Si multilayer beam splitter. Over the 15￣17 nm wavelength range, the s- re- flectivity of the non- periodic Mo/Si broadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more than 97.8%. At the fixed energy of 8 keV (Cu Kαline), the W/Si supermirror has the reflectivity of above 30% in the angle range of 0.4°￣0.85°, and a W/B4C supermirror has the reflectivity of about 20% in the angle range of 0.9°￣1.2°, and the reflectivity of W/C supermirror working in the grazing incident angle range of 0.9°￣1.2°is about 20%. The experimental results of some high- reflectance mirrors in our lab are also pre- sented, such as Mo/Si, Mo/Y, Cr/C, La/B4C, Si/C and Si/SiC. The reflectivity of Mo/Si multilayer is as high as 61.1% at wavelength of 13.4 nm.In EUV and X-ray regions, multilayer mirrors are the essential and necessary, optics elements. The good prospects of the EUV and X-rays for next generation lithography system, microscopy in the ＂water winctows＂, astro- nomical telescope, spectroscopy, plasma diagnostics, and X-ray laser have impelled the development of multilayer optics. The paper introduces the recent results of the multilayer optics elements in Tongji University, including beam splitters, broadband/angular polarizers, supermirrors and high-reflectance mirrors. The product of reflectivity and trausmissivity is above 4% for the Mo/Si multilayer beam splitter. Over the 15～17 nm wavelength range, the s-re-flectivity of the non-periodic Mo/Si breadband multilayer polarizers is reasonably constant, as high as 36.6%, and the degree of polarization is more tban 97.8%. At the fixed energy of 8 keV （Cu Kα line）, the W/Si supermirror has the reflectivity of above 30% in the angle range of 0.4°～0.85°, and a W/B4C superefirror has the reflectivity of about 20% in the angle range of 0.9°～1.2°, and the rcflcctivity of W/C supermirror working in the grazing incident angle range of 0.9°～1.2° is about 20%. The experimental results of some higb-reflectance mirrors in our lab are also presented, such as Mo/Si, Mo/Y, Cr/C, La/B4C, Si/C and Si/SiC. The reflectivity of Mo/Si multilayer is as high as 61.1% at wavelength of 13.4 nm.

关 键 词：EUV 软X射线 同济大学 多层膜 应用光学 电子束 宽带偏振器 

分 类 号：TN929.11[电子电信—通信与信息系统] O439[电子电信—信息与通信工程]