铝硅合金表面纳米颗粒的原子力显微镜观察  

Observations of Nanoparticles on 200℃ Magnetron Sputtered Al-Si Alloy Surface by AFM

作　　者：吴敬文[1] 陆祖宏[1] 范捷 朱伟民[1] 

机构地区：[1]东南大学分子与生物分子电子学实验室,江苏无锡华晶电子集团支援中心

出　　处：《微电子学》1996年第1期40-42,共3页Microelectronics

摘　　要：利用原子力显微镜首次观察到２００℃磁控溅射铝硅合金表面存在纳米颗粒。经测量，此纳米颗粒直径约２０ｎｍ、高约１ｎｍ。根据此纳米颗粒的分布，讨论了磁控溅射薄膜的生长机理；同时，还讨论了此纳米颗粒对半导体工艺的影响。Nanoparticles on magnetron sputtered Al-St alloy surface were observed by Atomic Force Microscope(AFM). These particles are measured to be about 20 um in diameter and about 1um in height. Based on the distribution of these particles, the growth mechanism of magnetron sputtering films are discussed. The effect of the nanoparticles on the semiconductor process is examined.

关 键 词：半导体材料 纳米颗粒 原子力显微镜 铝硅合金 

分 类 号：TN304.05[电子电信—物理电子学]