CVD温度对钼沉积层组织及性能的影响  

Effect of Chemical Vapor Deposition Temperature on Microstructures and Properties of Molybdenum Coatings

作　　者：马捷[1] 毕安园[1] 王从曾[1] 周美玲[1] 

机构地区：[1]北京工业大学功能材料教育部重点实验室,北京100022

出　　处：《稀有金属材料与工程》2005年第12期1965-1968,共4页Rare Metal Materials and Engineering

基　　金：国家"863"计划项目(2003AA305990)

摘　　要：介绍了化学气相沉积法(CVD)制备难熔金属钼膜层的原理和方法。以MoF_6和H_2为原料,采用化学气相沉积法在纯铜基体上沉积出难熔金属钼膜层。分析研究了沉积层的组织、结构和硬度。实验结果表明：沉积膜层显微组织随沉积温度变化而不同,沉积温度较低时,沉积层显微组织为细晶层状结构,沉积层硬度可达677×9.8 MPa：沉积温度较高时,沉积层显微组织为致密的柱状晶,硬度稍高于一般烧结钼的硬度。This paper presented the principle and method of chemical vapor depositing molybdenum. Molybdenum coatings were deposited on copper substrates from the mixture of MoF6 and H2. The microstructures and microhardness of the deposits were analyzed. The results show that the microstructures changes with the variation of deposition temperature. The microstructures of deposited layer presents a fine grains multilayer structure with a microhardness up to 677 × 9.8 MPa at a relatively low deposition temperature, while a compact columnar crystals microstructure at a higher deposition temperature.

关 键 词：化学气相沉积 钼 显微组织 

分 类 号：TG174.4[金属学及工艺—金属表面处理]