倍频波长分离膜半波孔的消除  

Elimination of the half-wave hole for harmonic beam splitter

作　　者：马小凤[1] 余祥[1] 王英剑[1] 邵建达[1] 范正修[1] 

机构地区：[1]中国科学院上海光学精密机械研究所光学薄膜技术研发中心

出　　处：《强激光与粒子束》2005年第B04期155-158,共4页High Power Laser and Particle Beams

基　　金：国家863计划项目资助课题

摘　　要：指出了膜料色散、膜层折射率非均匀性以及膜厚控制误差积累等是导致半波孔产生的几个因素,其中膜层厚度周期性误差积累和敏感层厚度误差是导致半波孔的主要因素,还指出了半波孔的大小与膜系结构有关。借助计算机做了相应的数值计算,并从理论上进行了深入分析。针对这些因素采取相应的措施,设计和制备了倍频波长分离膜,有效地消除了半波孔。并给出了理论和实验光谱曲线,二者有很好的一致性。The dispersion and refractive index inhomogeneity of film materials and error accumulation of layers thickness are all the factors that cause the half-wave hole for a harmonic beam splitter, among them the periodic error accumulation of layer thickness and sensitive layer error is the primary one. Furthermore, the stack structure is also related to the half-wave hole. With the aid of TFCALC the numerical calculations and theoretical analysis were performed. Measures are taken and a harmonic beam splitter was designed and fabricated. The half-wave hole was eliminated fundamentally. Both theoretical and experimental curves are given in this paper, which agree well with each other.

关 键 词：倍频波长分离膜 半波孔 色散 折射率非均匀性 

分 类 号：O484[理学—固体物理]