Ge薄膜X光激光靶的研制  

THE PREPARATION OF GERMANIUM FOIL X-RAY LASER TARGET

作　　者：周斌[1] 王珏[1] 杜保旗[1] 陈玲燕[1] 

机构地区：[1]同济大学波耳固体物理研究所

出　　处：《原子能科学技术》1996年第1期8-16,共9页Atomic Energy Science and Technology

基　　金：国家高技术强激光领域基金

摘　　要：针对Ｇｅ薄膜应力较大的特点，采用热蒸发方式制备Ｇｅ膜。研究了不同脱膜剂和基片温度对Ｇｅ膜结构的影响。采用新的反粘脱膜工艺，制备出了比较满意的Ｇｅ薄膜靶。In accordance with strong internal stress of germanium foil, the foil is prepared on glass substrate with different removers using thermal evaporation technique. The structures of foil derived from different preparation process are analysed. A new remover and a special process are used to obtain germanium foil targets with high quality.

关 键 词：锗 薄膜靶 脱膜剂 膜结构 X光激光 

分 类 号：TN24[电子电信—物理电子学]