改性金刚石膜的形貌、结构和附着性能  

Morphology, structure and adhesion of modified diamond films

作　　者：黄元盛[1] 邱万奇[2] 罗承萍[2] 黄彩娥[1] 

机构地区：[1]韶关学院机电系,广东韶关512005 [2]华南理工大学机械工程学院,广东广州510640

出　　处：《材料科学与工艺》2006年第1期109-112,共4页Materials Science and Technology

基　　金：国家教委博士点基金项目(1999056121);广东省自然科学基金资助项目(04300026);广东省自然科学基金重点资项目(013004)

摘　　要：为了提高金刚石膜/基附着力,通过氧辅助使高温钨丝蒸发,在基底表面与碳氢基团反应生成纳米碳化钨,从而得到金刚石和纳米碳化钨混合的改性金刚石膜.用扫描电子显微镜、X射线衍射仪和压痕法研究了改性金刚石膜的形貌、结构和附着力性能.结果表明,碳钨化合物以纳米相存在于改性金刚石膜中.碳钨化合物的存在使改性金刚石膜的硬度下降,但是适当的碳钨化合物能使膜/基附着力性能得到较大提高.当氧气通入量为1.2 sccm时,膜/基附着力性能最好.In order to improve the adhesion of diamond films, Tungsten was evaporated and reacted with methane to form tungsten carbide which mixed with diamond. The diamond with tungsten carbide was call modified diamond film. The morphology, structure and adhesion of the modified diamond films were investigated with scanning electronic microscope, X -ray diffractometer and indention. The results show that tungsten carbide in the modified diamond films is nanophase. The adhesion of the modified diamond films is better than that of the diamond without tungsten carbide although tungsten carbide reduces the hardness of the modified diamond films. The adhesion is best when the flux of oxygen is 1.2 sccm.

关 键 词：改性金刚石膜 化学气相沉积 碳钨化合物 附着力性能 氧气 

分 类 号：O484.1[理学—固体物理]