基底温度对YbF_3薄膜缺陷和光学性能影响研究  

Study on the influence of substance temperature on the defect and optical performance of single YbF_3 films

作　　者：张耀平[1] 张云洞[1] 凌宁[1] 许鸿[1] 

机构地区：[1]中国科学院光电技术研究所

出　　处：《光学仪器》2006年第1期93-96,共4页Optical Instruments

基　　金：国家863课题资助项目

摘　　要：采用热蒸发法镀制了单层Y bF3薄膜,观察了薄膜表面主要的微观结构缺陷,研究了沉积温度对薄膜折射率与表面缺陷的影响,测量了薄膜施加沉积温度前后的粗糙度变化。结果表明:通过加温可以降低薄膜的表面粗糙度与缺陷密度大小。A series of single YbF3 films were prepared by evaporation. The microstructure defects on film surfaces and the effect of deposition temperature on it were investigated. The rms surface roughness was measured. It was shown that the film surface defect density could decreased by applying deposition temperature.

关 键 词：YbF3薄膜 表面粗糙度 缺陷密度 光学薄膜 

分 类 号：O484.1[理学—固体物理]