光学相干显微术测量散射介质内层形貌的研究  

Measurement of Scattering Media's Interface Roughness by Optical Coherence Microscopy

作　　者：朱永凯[1] 李纪念[1] 孙艳[1] 赵宏[1] 王昭[1] 

机构地区：[1]西安交通大学机械制造系统工程国家重点实验室,陕西西安710049

出　　处：《半导体光电》2006年第1期92-94,共3页Semiconductor Optoelectronics

摘　　要：提出了采用光学相干显微术测量散射介质内层形貌的方法,该方法基于低相干术和共焦显微术,其纵向测试精度是由共焦门与相干门共同决定的,能有效地排除非焦面处的杂散光的影响。通过对样品内层的三维扫描,测量样品的不同点的厚度,最终透过表面层得到了样品的内层形貌,实际实验中的轴向分辨率约为5μm,横向分辨率约为1.2μm。该方法对样品无破坏作用,能有效地测量散射样品内层形貌,且具有测试精度高、工作可靠的特点。A method to measure scattering media＇s interface roughness with optical coherence microscopy（OCM） is proposed, which is based on low coherence interferometry and confocal microscopy. The axial resolution of OCM system is determined by confocal gate and coherence gate. However, OCM is more effective in the rejection of out of focus and multiple scattered photons originating further away of the focal plane. With the three-dimensional scanning, the interface roughtness is achieved by measuring the thickness of different points on the sample. The axial resolution is 5 μm, lateral resolution is 1.2 μm. This method is possessed of the advantages over the other measurement method, such as non-destroy, high-resolution on the measurement of scattering media and high reliability.

关 键 词：光学相干显微术 散射介质 内层形貌 

分 类 号：TN744.3[电子电信—电路与系统]