用PLD法在MgO(100)衬底上生长ZnO薄膜的结构和光学特性  

Structural and optical properties of ZnO films deposited on MgO(100) substrates by PLD

作　　者：苏凤莲[1] 汪洪[1] 李爱侠[1] 刘艳美[1] 周圣明[1] 

机构地区：[1]安徽大学物理与材料科学学院,安徽合肥230039

出　　处：《安徽大学学报（自然科学版）》2006年第2期67-70,共4页Journal of Anhui University(Natural Science Edition)

基　　金：安徽省优秀青年基金资助项目(00047208);高等学校安徽省学术技术带头人科研资助项目

摘　　要：用脉冲激光沉积法在MgO(100)衬底上沉积了ZnO薄膜.衬底温度分别为400℃、550℃和700℃.利用X射线衍射(XRD)和光致发光谱(PL)对薄膜的结构和光学性能进行研究.X射线衍射的结果表明,在400℃和550℃下生长的ZnO薄膜具有高度c-轴择优取向,但是当衬底温度升高到700℃时,薄膜由单一的择优取向变为有两个较强的择优取向.通过光致发光谱可以发现,在550℃下生长的ZnO薄膜具有强的紫外发射和窄的FWHM,并且紫外发光峰的强度与ZnO薄膜的结晶质量密切相关.ZnO thin films have been fabricated by pulsed laser deposition （PLD） technique on MgO （100） substrates. Substrate temperatures were varied in the range of 400 -700℃. The structural and optical properties were characterized with X - ray diffraction （XRD） and photoluminescence （ PL）, respectively. XRD results indicated that the ZnO films grown at 400℃ and 550℃ were all highly c - axis oriented. But the micro - structure of the ZnO film changed to the one with multi - orientation when the substrate temperature increased to 700℃. It has been observed that the exciton emission dominates in the photoluminescence spectra, and concluded that the intensity of the UV luminescence strongly depends on the crystalline quality of the ZnO films.

关 键 词：ZNO薄膜 脉冲激光沉积 X射线衍射 光致发光谱 

分 类 号：O484[理学—固体物理]