半导体量子阱材料微加工光子晶体的光学特性  

Optical properties of semiconductor quantum-well material using photonic crystal fabricated by micro-fabrication machine

作　　者：许兴胜[1] 熊志刚[2] 孙增辉[1] 杜伟[1] 鲁琳[1] 陈弘达[1] 金爱子[2] 张道中[2] 

机构地区：[1]中国科学院半导体研究所光电子集成国家重点实验室,北京100083 [2]中国科学院物理研究所,北京100080

出　　处：《物理学报》2006年第3期1248-1252,共5页Acta Physica Sinica

基　　金：国家重点基础研究发展规划(批准号:2001CB610402);国家高技术研究发展计划(批准号:2003AA311020);国家自然科学基金(批准号:60345008;60377011)资助的课题.~~

摘　　要：利用聚焦离子束刻蚀方法和电子束制版结合干法刻蚀方法制备了二维近红外波段光子晶体,发现两种方法都可以制备出均匀的二维光子晶体,聚焦离子束方法操作简单,电子束制版结合干法刻蚀方法操作步骤复杂.光谱测试表明,利用聚焦离子束方法在有源材料上刻蚀的光子晶体不发光,而电子束制版结合干法刻蚀方法制备的小晶格常数光子晶体即使有些无序,其出光效率也提高到没有光子晶体时的两倍.对两种方法所加工的光子晶体不发光和提高出光效率的机理进行了分析.Two-dimensional photonic crystals in near infrared region were fabricated by using the focused ion beam （FIB） method and the method of electron-beam lithography （EBL） combined with dry etching. Both methods can fabricate perfect crystals, the method of FIB is simple, the other is more complicated. It is shown that the material with the photonic crystal fabricated by FIB has no fluorescence, on the other hand, the small-lattice photonic crystal made by EBL combined with dry etching can enhance the extraction efficiency two folds, though the photonic crystal has some disorder. The mechanisms of the enhanced-emission and the absence of emission are also discussed.

关 键 词：聚焦离子束 电子束制版 光子晶体 出光效率 

分 类 号：O734[理学—晶体学]