Si基铁电Bi_(3·15)Nd_(0·85)Ti_3O_(12)多层薄膜的一致取向生长和性能的研究  

Growth and properties of the c-axis oriented Bi_(3·15)Nd_(0·85)Ti_3O_(12) ferroelectric multi-layer thin films on silicon substrates

作　　者：李少珍[1] 李美亚[1] 徐文广[1] 魏建华[1] 赵兴中[1] 

机构地区：[1]武汉大学物理科学与技术学院,武汉430072

出　　处：《物理学报》2006年第3期1472-1478,共7页Acta Physica Sinica

基　　金：湖北省自然科学基金(批准号:2004ABA082)资助的课题.~~

摘　　要：采用脉冲激光沉积(PLD)技术,利用LSCO/CeO2/YSZ多异质缓冲层,在Si(100)基片上成功地制备了c轴一致取向的Bi_(3·15)Nd_(0·85)Ti_3O_(12)(BNT)铁电薄膜.利用X射线衍射(XRD)和扫描电镜(SEM)分析测定了薄膜的相结构、取向和形貌特征,考察了沉积温度和氧分压对BNT薄膜微结构、取向和形貌的影响,确定了BNT薄膜的最佳沉积条件.对在优化的条件下制备得到的BNT薄膜的C-V曲线测试得到了典型的蝴蝶形曲线,表明该薄膜具有较好的电极化反转存储特性.最后讨论了BNT薄膜铁电性能与薄膜取向的相关性.The e-axis oriented Bi3.15 Nd0.75 Ti3O12 （BNT） ferroeleetric thin films were grown on Si（100） substrates by pulsed laser deposition with La0.5 Sr0.5 CoO3/CeO2/Y0.18 Zr0.91 O2.01 multi-heterostructure as buffer layer. X-ray diffraction and scanning electron microscopy were used to determine the microstructure, orientation and morphology of the multi-layer films. The influence of deposition temperatures and the partial oxygen pressure on the microstructure, orientation and morphology of the BNT films were investigated and the optimal deposition parameters were determined. The BNT multi-layer thin films deposited under optimal condition have good electric properties. The C-V pattern of the BNT multilayer thin films deposited under optimal deposition conditions has the typical butterfly-like shape, suggesting that the films have good polarization-reversion storage properties. The correlation between the ferroelectric properties and the orientations of the BNT films is discussed.

关 键 词：BI3.15ND0.85TI3O12 铁电薄膜 多层异质结 脉冲激光沉积 

分 类 号：O484.1[理学—固体物理]