电子流注入水稻幼穗组织培养效应的研究  

EFFECT OF ELECTRON BEAM IMPLANTATION ON in vitro CULTURE OF YOUNG RICE PANICLE

作　　者：舒庆尧[1] 吴殿星[1] 夏英武[1] 谢嘉华[1] 叶阿宝 

机构地区：[1]浙江农业大学核农所,杭州310029

出　　处：《核农学报》1996年第2期84-88,共5页Journal of Nuclear Agricultural Sciences

摘　　要：以两用核不育系新光S幼穗为材料,以γ射线辐照作对照,研究了电子流注入对水稻离体培养的反应。结果表明,电子流注入对离体培养的效应与γ射线辐照具有相似性。对愈伤组织的诱导、分化主要表现为抑制效应,但对植株再生具有促进作用。10～15秒电子流注入可使幼穗的出愈率和分化率保持对照水平或略低,而再生能力大幅度提高。With reference to gamma rays, the effect of electron beam implantation (EBI) was studied on in vitro culture of rice young panicle c.v. Xinguang S, a photoperiod/temperature sensitive genie male sterile line. There were many similiarities between EBI and gamma rays in regards of effects on in vitro culture. EBI suppressed calli induction and differentiation but stimulated plantlet regeneration. 10-15 second EBI treatment could greatly promote the regenerability with a slight decrease in calli induction and differentiation ability.

关 键 词：电子流注入 Γ射线辐照 水稻 离体培养 

分 类 号：S511.035.2[农业科学—作物学] S124.1