Cr-Cu-Si金属硅化物合金组织与耐磨性  

Microstructure and Wear Resistance of a Cr-Cu-Si Metal Silicide Alloy

作　　者：尹延西[1] 李安[1] 张凌云[1] 王华明[1] 

机构地区：[1]北京航空航天大学激光材料加工与表面工程实验室,北京100083

出　　处：《稀有金属材料与工程》2006年第3期391-394,共4页Rare Metal Materials and Engineering

基　　金：国家自然科学基金重点项目(50331010);国家高技术研究发展计划资助课题(2003AA305750;2002AA305203);国防基础科研项目;航空基础科学基金(02H51011)资助项目

摘　　要：利用激光熔炼材料制备技术,制得了由铜基固溶体增韧的Cr5Si3/CrSi金属硅化物新型耐磨合金,分析了合金的显微组织结构,测定了合金的显微硬度,考察了合金在室温干滑动磨损条件下的耐磨性能。研究结果表明:Cr-Cu-Si金属硅化物合金显微组织由Cr5Si3金属硅化物初生树枝晶、CrSi相的初生树枝晶及枝晶间铜基固溶体组成,由于金属硅化物Cr5Si3及CrSi的高硬度、强原子间结合力与铜基固溶体的优异导热性、摩擦相容性,上述激光熔炼Cr-Cu-Si金属硅化物合金材料在室温滑动干摩擦试验条件下表现出优异的耐磨性。A wear resistant Cr-Cu-Si metal silicide alloy having a microstructure consisting of the primary dual-phase dendrite with a Cr5Si3 core encapsulated by CrSi phase and the interdendritic ductile Cu-based solid solution was fabricated by the laser melting process. Microstructure of the Cr-Cu-Si metal silicide alloy was characterized by OM, SEM, XRD and EDS. Microhardness was measured using a MH-6 semi-automatic Vickers micro-hardness tester. Because the wear-resistant metal silicide CrsSi3 and CrSi have high hardness, strong covalent-dominated atomic bonds, and the ductile Cu-based solid solution has excellent thermal conductivity, low coefficient of friction and excellent ductility, the Cr-Cu-Si metal silicide alloy has excellent wear resistance under room temperature dry sliding wear test conditions.

关 键 词：金属硅化物 耐磨性 显微组织 激光熔炼 

分 类 号：TG113[金属学及工艺—物理冶金]