硅片表面球形粒子散射研究  

Calculation of Light Scattering from a Spherical Particle on a Silicon Wafer

作　　者：曹楷[1,2] 程兆谷[1] 高海军[1] 

机构地区：[1]中国科学院上海光学精密机械研究所 [2]中国科学院研究生院,北京100039

出　　处：《光子学报》2006年第4期517-520,共4页Acta Photonica Sinica

基　　金：上海市第三期光科技项目(编号:036105026)资助

摘　　要：为求解硅片表面微小粒子在任意线偏振平面入射光照射下的散射光光强分布,选择了基于Mie散射的杨氏模型为依据,推导了该模型下散射光强空间分布的计算方法,并给出了0.54μm球形粒子在垂直、倾斜入射下光强空间分布的模拟计算结果,以及入射平面第一象限内散射光强与国外已发表实验结果的比较·The Unobstructed Reflection Model （Young Theory） for calculating light scattering from a spherical particle on a smooth surface is reviewed and presented with special attention to the polarization of the incident beam and position of the detector. As a test of the approximation, some calculations for 0. 54 μm diameter polystyrene latex spheres （PSL） on a silicon wafer is carried out. The results of these tests are presented and compared with experimental results that published abroad previously.

关 键 词：硅片 散射 米氏理论 杨氏模型 微分散射截面 

分 类 号：TN247[电子电信—物理电子学]