离子束辅助沉积对TiAlSiN薄膜性能的影响  

The Effects of Ion Beam Assisted Deposition on Properties of TiAlSiN Thin Films

作　　者：秦聪祥[1] 曾鹏[1] 胡社军[1] 汝强[1] 

机构地区：[1]广东工业大学材料与能源学院,广东广州510643

出　　处：《钛工业进展》2006年第2期25-28,共4页Titanium Industry Progress

基　　金：国家自然科学基金资助项目(50271019)

摘　　要：分别利用真空电弧沉积技术与等离子体辅助真空电弧沉积技术在不锈钢片、高速钢片和单晶硅片上沉积TiAlSiN多元薄膜,通过X射线衍射和扫描电镜对采用两种方法制备的薄膜物相及表面形貌进行了分析比较,测定了高速钢片上薄膜的显微硬度,进行了耐磨性实验。结果表明,采用离子束辅助沉积制备的薄膜,有(200)面的择优取向,薄膜的表面形貌得到改善,硬度和耐磨性提高。TiAlSiN films deposited on stainless steel, HSS and p〈100〉 silicon substrates were prepared by ion beam assisted deposition and vacuum electric arc deposition technology. The films phasc and morphology obtained by these processes were analyzed and compared by XRD and SEM. The microhardness of the films on HSS was determined and their wear resistance was studied. The results show that the films obtained by plasma auxiliary vacuum arc deposition technology have a preferred orientation on （200） crystal face, the surface morphology gets improved, and the microhardness and wear resistance of the films increase.

关 键 词：离子束辅助沉积 TiAlSiN 电弧离子镀 

分 类 号：TB383.2[一般工业技术—材料科学与工程]