分步式压印光刻研究  

Research on Step Imprint Lithography

作　　者：邱志惠[1] 丁玉成[1] 刘红忠[1] 卢秉恒[1] 

机构地区：[1]西安交通大学先进制造研究所,陕西西安710049

出　　处：《纳米科技》2006年第2期26-29,共4页

基　　金：国家自然科学基金资助项目（50275118）;国家863计划重点资助项目（2002AA420050）.

摘　　要：针对微纳制造中光刻环节的光衍射限制，讨论了可能成为下一代光刻技术路线的压印光刻。通过对比热压印、微接触转印及常温压印的技术特点，设计了一套低成本、结构简单的紫外光固化常温压印光刻机构。其大行程纳米级定位、纳米级下压系统消除了压印过程中的机构热变形误差、驱动间隙、蠕动误差等，具有分步式纳米级驱动多场压印及纳米级下压加载能力，可实现多次重复高保真图形复制。Due to the diffracting limitation of the photolithography, imprint lithography technology, which maybe next generation lithography technology, is described. Through contrasting the different characters among the hot embossing, micro-contact printing and room temperature imprint lithography, a low cost and simple structure imprint lithography prototype tool, which includes maro-mirco positioning and ultra precision loading system, is designed, This tool can realize the step imprint lithography in 120ram move range with 20nm positioning accuracy, achieve the nano scale pressing and demoulding, and at the same time avoid the disturbing errors coming from hot, backlash, friction and creep.

关 键 词：微纳制造 压印 光刻 

分 类 号：TP242[自动化与计算机技术—检测技术与自动化装置]