环化聚丁二烯的合成及其在光刻胶中的应用  被引量:3

Synthesis of Cyclized Polybutadiene and Its Application in Photoresists

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作  者:张玉军[1] 郑岩[1] 张明艳[1] 

机构地区:[1]哈尔滨理工大学材料科学与工程学院,黑龙江哈尔滨150080

出  处:《化学与粘合》2006年第3期191-193,共3页Chemistry and Adhesion

基  金:黑龙江省海外学人科技合作项目(编号:1053HQ001);哈尔滨市青年基金资助项目(编号:2004AFQXJ048)

摘  要:本文扼要地阐述了国内外环化橡胶的研究发展状况,介绍了环化天然橡胶、环化聚异戊二烯橡胶和环化聚丁二烯橡胶的合成新方法及其结构表征技术。其中,重点介绍了环化聚丁二烯橡胶的合成新技术。由于环化橡胶负性光刻胶对金属及硅片的粘接性和耐酸性方面的优异性能以及其良好的热稳定性能,因此被广泛应用于硅、二氧化硅及铬不锈钢等材料的光刻,因而在高密度集成电路的生产与研制上得到了广泛应用。同时,本文还介绍了市场上常见的几种环化橡胶光刻胶产品。The research situation about the synthesis and characterization of cyclized robbers including cyclised natural rubbers,cyclized polyisoprene rubbers as well as cyclised polybutadione rubbers were set forth and illustrated in this paper. Of all the cyclized rubbers, the synthesis technique of cyclized polybutadiene rubbers and their application in photoresists were predominantly reviewed. The cyclized robbers photoresists have been widely used in photoetching on silicon, silica, chrome non - corrosive steel or high - density photoetching integrated circuit because of their good adhesion with metal and chips of silicon, good acid resistance as well as heat resistance. In addition,several products of negative photoresists in the market were also introduced in this paper.

关 键 词:环化聚丁二烯 合成 光刻胶 

分 类 号:TQ331.419[化学工程—橡胶工业]

 

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