磁控溅射方法制备垂直取向FePt/BN颗粒膜  

The preparation of FePt/BN particle films with perpendicular texture by magnetron sputtering

作　　者：李宝河[1] 冯春[1] 杨涛[1] 翟中海[1] 滕蛟[1] 于广华[1] 朱逢吾[1] 

机构地区：[1]北京科技大学材料物理系

出　　处：《物理学报》2006年第5期2562-2566,共5页Acta Physica Sinica

基　　金：国家自然科学基金(批准号:50571007);北京市教育委员会科技发展计划项目(批准号:KM200610011005)资助的课题~~

摘　　要：用磁控溅射在热单晶MgO(100)基片上制备了[FePt/BN]多层膜,经真空热处理后,得到具有垂直取向L10-FePt/BN颗粒膜.X射线衍射结果和磁性测量的结果表明,[FePt(2nm)/BN(0·5nm)]10和[FePt(1nm)/BN(0·25nm)]20多层膜经700℃热处理1h后,均具有较好的(001)取向.[FePt(1nm)/BN(0·25nm)]20垂直矫顽力达到522kA/m,剩磁比达到0·99,开关场分布S*达到0·94,FePt晶粒平均尺寸约15—20nm,适合用于将来超高密度的垂直磁记录介质.[FePt/BN]n multilayers were prepared on MgO （100） single crystal substrates at 250℃ with magnetron sputtering. The perpendicular texture of Llo-FePt/BN particle films was formed after vacuum annealing. The results of X-ray diffraction and magnetic tests show that the [ FePt（2nm）/BN（0.5nm）]10 and [FePt（1nm）/BN（0.25nm）]2o multilayers have excellent （001） texture when the films were sputtered on substrates at 250℃ after annealed at 700℃ for lh. The mean size of Llo-FePt particles is roughly 15-20nm and its perpendicular coercive force reaches 522 kA/m. Moreover, the Mr/Ms and switching filed distribution S ^＊ reach 0.99 and 0.94, respectively. This particle film is a candidate for future perpendicular magnetic recording media with ultrahigh density.

关 键 词：磁控溅射 垂直磁记录 L10-FePt/BN纳米颗粒膜 

分 类 号：TM271[一般工业技术—材料科学与工程]