辉光放电中处理聚四氟乙烯表面——Ⅱ.ESR研究PTFE膜自由基  

STUDY ON FREE RADICALS OF PTFE FILM TREATED BY PLASMA

作　　者：周茂堂[1] 刘桂珍[1] 詹瑞云[1] 王世才[1] 陈捷[1] 

机构地区：[1]中国科学院长春应用化学研究所

出　　处：《波谱学杂志》1990年第4期427-432,共6页Chinese Journal of Magnetic Resonance

摘　　要：在外部电极电容耦合式反应装置中,对聚四氟乙烯(PTFE)膜进行了辉光放电处理。通过电子自旋共振(ESR)谱研究了PTFE在处理过程中所产生的自由基,着重讨论了温度对ESR谱的影响。最后,以DPPH为内标,测定了处理后PTFE膜的自由基浓度,并考察了自由基在空气中的衰减情况。The plasma treatment of polytetrafluoroethylene (PTFE) film was carried out in a capacitively coupled reactor with external electrodes. The free radicals produced in the process of treatment were detected by ESR techniques. The effect of temperature on the ESR spectra was discussed in detail. Finally, the attenuation of the free radicals was investigated.

关 键 词：辉光 放电 聚四氟乙烯 自由基 ESR 

分 类 号：TQ325.4[化学工程—合成树脂塑料工业]