轰击能量对离子束增强沉积Cr-N薄膜微观结构和硬度的影响  

INFLUENCE OF BOMBARDING ENERGY ON THE MICROSTRUCTURE AND MICROHARDNESS OF Cr-N THIN FILMS SYNTHESISED BY IBED

作　　者：王兵[1] 赖祖武[1] 江崇滨 李文治[2] 贺小明[2] 

机构地区：[1]中国工程物理研究院北京研究生部,北京100088 [2]清华大学材料科学与工程系,北京100084

出　　处：《真空科学与技术》1996年第1期5-9,共5页Vacuum Science and Technology

摘　　要：采用离子束增强沉积（IBED）技术，在不同能量氮离子的辅助轰击下制备了Cr－N薄膜；通过SEM观察、XRD分析和显微硬度测定，发现离子轰击能量对Cr－N薄膜的表面形貌、相组成和硬度有显著的影响：随着能量的升高，膜表面形貌由岛形颗粒状转变成蜂窝状；一定能量轰击下获得的Cr2N和CrN混相结构有最高的薄膜硬度；高达16keV的氮离子轰击可诱发非晶化的出现，并对膜有一定的强化作用。在此基础上探讨了离子轰击能量对合成Cr－N薄膜结构与性能的影响效应。Cr-N thin films were synthesised at different bombarding energies of nitrogen ion by ionbeam-enhanced deposition technology. The fi1ms were characterized by microhardness,SEM and XRD,whichdemonstrated that the morphology,phase composition and hardness of Cr-N thin films were obviously influ enced by the energies of bombarding ion. It was shown that with the increasing of energies,the morphologychanged from grained to honeycomb-like,mixed phase consisted with Cr2N and CrN which was prepared atcertain energy had the highest microhardness,amorphism which had the effect of strengthening the film couldbe induced by bombarding with ion energy of 16 keV. On such a basis we have also discussed the effect of en ergies of bombarding ion on the synthesis of Cr-N thin films.

关 键 词：离子束增强沉积 轰击能量 氮化铬 薄膜 

分 类 号：O484.1[理学—固体物理]