NdFe_(7-x)Mo_x薄膜的制备和磁性研究  

THE FABRICATION AND MAGNETISM RESEARCH OF NdFe_（7-x）Mo_x FILMS

作　　者：顾卫东[1] 姜恩永[1] 刘明升[1] 

机构地区：[1]天津大学应用物理学系薄膜研究室,天津300072

出　　处：《真空科学与技术》1995年第6期379-382,共4页Vacuum Science and Technology

摘　　要：利用对向靶溅射，同时对基片进行退火处理的方法，在玻璃基片上成功地制备出了NdFe7-xMox（x=0，0．5）薄膜，并对其进行了磁性研究。VSM测量结果表明，Mo掺入导致了材料矫顽力Hc的增大，却相应降低了饱和磁化强度Ms。随着退火温度T的提高，Hc随之增大，当T=573K时，出现一极大值为37．8kA／m，此时的热磁测量表明，样品具有最高居里温度，Tc=775K。The NdFe7-xMox (x=0, 0. 5) films have been synthesized on the glass by facing-target sputtering, while the substrates are held at different annealing temperatures. We have investigated the sample's magnetism by VSM,and found that the coercivity,Hc,increases because some of the Fe atoms are substituted by Mo atoms,and the saturation magnetization Ms decreases relatively. The results show that Hc is improved as the annealing temperature increases,and at T= 573 K, Hc has a maximum value of 37. 8 kA/m. The thermomagnetic measurement shows that this sample has the highest Curie temperature,Tc=775 K.

关 键 词：对向靶溅射 退火温度 矫顽力 金属互化物 薄膜 

分 类 号：O484.1[理学—固体物理] O484.4[理学—物理]