数值分析在不同偏振时复杂样品的近场强度分布  

Numerical analysis of near-field intensity distribution above complex samples with different polarization

作　　者：代云丽[1] 简国树[1] 李宏[1] 潘石[1] 

机构地区：[1]大连理工大学物理系,辽宁大连116024

出　　处：《光学技术》2006年第3期337-339,共3页Optical Technique

基　　金：国家自然科学基金项目(30270367);教育部博士点基金资助(2002141018)

摘　　要：采用三维时域有限差分法(FDTD),模拟计算了光子扫描隧道显微镜(PSTM)系统中的介质和银质金属样品在不同偏振模式光源下的近场强度分布。使用介质小样品检验探针性能,在探针不同位置计算得到了相似的近场强度分布图,说明编写的程序是可信的。给出了等高扫描时p偏振和s偏振条件下,“PSTM”字样介质样品和银质金属样品上方5nm处的近场强度分布图,结果显示:对介质样品,p偏振波能较好的反映样品的形貌,这是由入射电场的方向决定的;银质金属有表面增强作用,对不同偏振波均能在某种程度上反映样品的形貌,仍有待近一步的研究。The near-field imaging on dielectric and silver metal sample with different modes of polarization in system of photon scanning tunneling microscopy （PSTM） was simulated using 3D finite difference time domain （FDTD） method. To confirm the program, similar distributions of near-field intensity at different positions were obtained. The field distributions can be calculated in the plain of 5nm above the dielectric and silver metal sample of ＂PSTM＂ with p and s polarized incident wave. The results are： to dielectric sarnple, p polarized can reflect the profile better than polarized incident wave and the direction of the incident field determines the pattern of near-field intensity distribution; silver metal can enhance the near field intensity, both p and s polarized incident wave can reflect the profile in a way.

关 键 词：偏振 PSTM FDTD 近场强度分布 

分 类 号：TN16[电子电信—物理电子学] O242.1[理学—计算数学]