ECR等离子体气相沉积装置磁场形态的计算(英文)  

MAGNETIC FIELD CONFIGURATION OF A MICROWAVE ELECTRON CYCLOTRON RESONANCE PLASMA DEPOSITION DEVICE

作　　者：宁兆元[1] 叶超[1] 汪浩 沈明荣 

机构地区：[1]苏州大学物理科学与技术学院薄膜材料实验室

出　　处：《苏州大学学报（自然科学版）》1996年第2期51-57,共7页Journal of Soochow University(Natural Science Edition)

摘　　要：本文介绍了微波电子回旋共振等离子体气相沉积装置的磁场设计原理和计算方法,给出了几种电流强度、线圈间距等主要参量下的磁场形态.In this paper f the methods for designing and calculating the magnetic field of a microwave electron cyclotron resonance deposition device have been mentioned. The effects of the current and interval between two coils on the me genetic field profile have also been discussed

关 键 词：等离子体 ECR 气相沉积装置 磁场 电流强度 

分 类 号：O484.1[理学—固体物理] TB43[理学—物理]