用于衍射微光学元件制备的无掩模光刻技术  

Non-Mask Lithograph Technology for Manufacturing Diffractive Micro-Optical Devices

作　　者：陈劲松[1] 

机构地区：[1]安徽财经大学信息工程学院,安徽蚌埠233041

出　　处：《微纳电子技术》2006年第7期351-354,共4页Micronanoelectronic Technology

基　　金：安徽省教育厅自然科学基金项目(2006KJ050B)

摘　　要：提出了一种新的基于数字微镜的无掩模光刻技术,将以往的模拟掩模发展为数字掩模,为大规模、快速、灵活制作衍射微光学元件开辟了一条新的道路;重点研究了数字掩模技术的实现原理,并进行了验证。A new non-mask lithograph technology based on digital micromirror device is brought forward for the first time. It develops conventional analog mask into digital mask, and it inaugurates a road for manufacturing diffractive micro-optical elements on a large scale, fleetly, and flexibly. The realization principle of digital mask technology is studied emphatically, and the experimental validation is carried out.

关 键 词：数字微镜 数字掩模 衍射光学元件 空间光调制器 

分 类 号：TH74[机械工程—光学工程] TN305.7[机械工程—仪器科学与技术]