影响碲膜光学性能的因素  

Factors Influencing Optical Properties of Tellurium Film

作　　者：马玉天[1] 龚竹青[1] 武俊 李宏煦[3] 阳征会[1] 

机构地区：[1]中南大学冶金科学与工程学院,湖南长沙410083 [2]金川集团有限公司,甘肃金昌737100 [3]北京科技大学冶金生态学院,北京100083

出　　处：《稀有金属》2006年第3期333-338,共6页Chinese Journal of Rare Metals

基　　金：国家自然科学基金资助项目(50204001)

摘　　要：用XRD，SEM，FTIR光谱仪、UV／VIS／NIR光谱仪表征了由化学气相沉积制备的碲薄膜的结构和光学性能，结果表明碲膜的光学性能受膜的厚度、基体表面性质和膜的表面形貌的影响。沉积在裸聚乙烯箔基体上的碲膜（膜厚293nm）不仅在8-13μm光谱范围的透过率比沉积在Mn-0覆盖聚乙烯箔基体上的碲膜（膜厚216nm）的透过率高，而且还能有效地阻挡太阳光的透过，这些性能说明具有该厚度的碲膜可以应用于太阳光辐射屏与辐射制冷设备。Tellurium thin films were prepared by the chemical vapor deposition （CVD） method. The structure, surface morphology and optical properties of the Te thin films were analyzed by powder X-ray diffraction, scanning electron microscopy, FTIR transmission, UV/VIS/NIR transmission and reflectance. The results show that the optical properties of films are influenced by many factors such as film thickness, surface properties of substrate and surface morphology offilm. The Te films depositing on bare polyethylene as thick as 293 nm have higher IR transmission than depositing on Mn-O coated polyethylene （film thickness 216 nm） across the full 8- 13μm band and can effectively block up the transmission of the sun-ray, which indicates that Te films deposition on bare polyethylene with thickness of 293 nm can be used as good solar radiation shields and radiative cooling devices.

关 键 词：化学气相沉积 碲薄膜 光学性能 

分 类 号：O484.4[理学—固体物理]